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Multitechnique characterisation of Al203 thin layers deposited on SiO2/Si surface by atomic layer chemical vapour deposition

dc.contributor.authorHoussiau, L.
dc.contributor.authorVitchev, R.G.
dc.contributor.authorPireaux, J.J.
dc.contributor.authorConard, Thierry
dc.contributor.authorBender, Hugo
dc.contributor.authorRichard, Olivier
dc.contributor.authorMack, P.
dc.contributor.authorWolstenholme, J.
dc.contributor.authorDefranoux, C.
dc.date.accessioned2021-10-15T04:57:35Z
dc.date.available2021-10-15T04:57:35Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7668
dc.sourceIIOimport
dc.titleMultitechnique characterisation of Al203 thin layers deposited on SiO2/Si surface by atomic layer chemical vapour deposition
dc.typeProceedings paper
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorRichard, Olivier
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.source.peerreviewno
dc.source.beginpage36
dc.source.endpage38
dc.source.conferenceAVS 4th International Conference on Microelectronics and Interfaces - ICMI
dc.source.conferencedate3/03/2003
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec


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