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Reticle terminology and metrology needs for advanced 193nm and 157nm lithography

dc.contributor.authorJonckheere, Rik
dc.contributor.authorRonse, Kurt
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorLeunissen, Peter
dc.date.accessioned2021-10-15T05:04:26Z
dc.date.available2021-10-15T05:04:26Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7706
dc.sourceIIOimport
dc.titleReticle terminology and metrology needs for advanced 193nm and 157nm lithography
dc.typeOral presentation
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewno
dc.source.conferencePTB Seminar "CD Metrology"
dc.source.conferencedate20/11/2003
dc.source.conferencelocationBraunschweig Duitsland
imec.availabilityPublished - imec


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