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dc.contributor.authorJurczak, Gosia
dc.contributor.authorVeloso, Anabela
dc.contributor.authorRooyackers, Rita
dc.contributor.authorAugendre, Emmanuel
dc.contributor.authorMertens, Sofie
dc.contributor.authorRothschild, Aude
dc.contributor.authorSchaekers, Marc
dc.contributor.authorLindsay, Richard
dc.contributor.authorLauwers, Anne
dc.contributor.authorHenson, Kirklen
dc.contributor.authorSeveri, Simone
dc.contributor.authorPollentier, Ivan
dc.contributor.authorDe Keersgieter, An
dc.date.accessioned2021-10-15T05:05:54Z
dc.date.available2021-10-15T05:05:54Z
dc.date.issued2003-06
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7714
dc.sourceIIOimport
dc.titleChallenges in scaling of CMOS devices towards 65nm node
dc.typeProceedings paper
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorMertens, Sofie
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.orcidimecMertens, Sofie::0000-0002-1482-6730
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.source.peerreviewno
dc.source.conferenceDiagnostic and Yield
dc.source.conferencedate23/06/2003
dc.source.conferencelocationWarsaw Poland
imec.availabilityPublished - imec
imec.internalnotesproceedings from this conference are available only on CD


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