Authors

Kaushik, Vidya; De Gendt, Stefan; Carter, Richard; Claes, Martine; Röhr, Erika; Pantisano, Luigi; Kluth, Jon; Kerber, Andreas; Cosnier, Vincent; Cartier, Eduard; Tsai, Wilman; Young, Edward; Green, Martin; Chen, Jerry; Jang, S.A.; Lin, S.; Delabie, Annelies; Van Elshocht, Sven; Manabe, Yukiko; Richard, Olivier; Zhao, Chao; Bender, Hugo; Caymax, Matty; Heyns, Marc

Conference

Novel Materials and Processes for Advanced CMOS

Title

The influence of defects on campatibility and yield of the HfO2-polysilicon gate stack for CMOS integration

Publication type

Proceedings paper

Embargo date

9999-12-31