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Effective post-etch residue removal on low-k films using single wafer processing

dc.contributor.authorKesters, Els
dc.contributor.authorGhekiere, John
dc.contributor.authorVan Doorne, Patrick
dc.contributor.authorVereecke, Guy
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-15T05:09:43Z
dc.date.available2021-10-15T05:09:43Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7733
dc.sourceIIOimport
dc.titleEffective post-etch residue removal on low-k films using single wafer processing
dc.typeMeeting abstract
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.source.peerreviewno
dc.source.conference204th Meeting of the Electrochemical Society: 8th Int. Symp. on Cleaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate13/10/2003
dc.source.conferencelocationOrlando, FL USA
imec.availabilityPublished - imec
imec.internalnotesAbstract 760


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