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Investigation of poly-Si/HfO2 gate stacks in a self-aligned 70nm MOS process flow

dc.contributor.authorKubicek, Stefan
dc.contributor.authorChen, Jerry
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorCarter, Richard
dc.contributor.authorKaushik, Vidya
dc.contributor.authorLujan, Guilherme
dc.contributor.authorCartier, Eduard
dc.contributor.authorHenson, Kirklen
dc.contributor.authorPantisano, Luigi
dc.contributor.authorBeckx, Stephan
dc.contributor.authorJaenen, Patrick
dc.contributor.authorBoullart, Werner
dc.contributor.authorCaymax, Matty
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorDe Meyer, Kristin
dc.date.accessioned2021-10-15T05:14:52Z
dc.date.available2021-10-15T05:14:52Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7759
dc.sourceIIOimport
dc.titleInvestigation of poly-Si/HfO2 gate stacks in a self-aligned 70nm MOS process flow
dc.typeProceedings paper
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpage251
dc.source.endpage254
dc.source.conference33rd European Solid-State Devices Research Conference - ESSDERC
dc.source.conferencedate16/09/2003
dc.source.conferencelocationEstoril Portugal
imec.availabilityPublished - imec


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