Publication:

Investigation of poly-Si/HfO2 gate stacks in a self-aligned 70nm MOS process flow

Date

2003

Proceedings Paper

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Author(s)

Kubicek, Stefan

;

;

Ragnarsson, Lars-Ake

;

Carter, Richard

;

;

Lujan, Guilherme

;

Cartier, Eduard

;

Henson, Kirklen

;

Pantisano, Luigi

;

;

Jaenen, Patrick

;

Boullart, Werner

;

;

De Gendt, Stefan

;

;

De Meyer, Kristin

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1986 since deposited on 2021-10-15

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Acq. date: 2026-04-05