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Investigation of poly-Si/HfO2 gate stacks in a self-aligned 70nm MOS process flow

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dc.contributor.authorKubicek, Stefan
dc.contributor.authorChen, Jerry
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorCarter, Richard
dc.contributor.authorKaushik, Vidya
dc.contributor.authorLujan, Guilherme
dc.contributor.authorCartier, Eduard
dc.contributor.authorHenson, Kirklen
dc.contributor.authorPantisano, Luigi
dc.contributor.authorBeckx, Stephan
dc.contributor.authorJaenen, Patrick
dc.contributor.authorBoullart, Werner
dc.contributor.authorCaymax, Matty
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorDe Meyer, Kristin
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-15T05:14:52Z
dc.date.available2021-10-15T05:14:52Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7759
dc.source.beginpage251
dc.source.conference33rd European Solid-State Devices Research Conference - ESSDERC
dc.source.conferencedate16/09/2003
dc.source.conferencelocationEstoril Portugal
dc.source.endpage254
dc.title

Investigation of poly-Si/HfO2 gate stacks in a self-aligned 70nm MOS process flow

dc.typeProceedings paper
dspace.entity.typePublication
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