Investigation of poly-Si/HfO2 gate stacks in a self-aligned 70nm MOS process flow

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Author(s)

Kubicek, Stefan

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Ragnarsson, Lars-Ake

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Carter, Richard

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Lujan, Guilherme

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Cartier, Eduard

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Henson, Kirklen

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Pantisano, Luigi

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Jaenen, Patrick

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Boullart, Werner

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De Gendt, Stefan

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De Meyer, Kristin

Metrics

1976 since deposited on 2021-10-15

Acq. date: 2025-10-23