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Leakage optimatisation of ultra-shallow junctions formed by solid phase epitaxial regrowth (SPER)

dc.contributor.authorLindsay, Richard
dc.contributor.authorPawlak, Bartek
dc.contributor.authorKittl, Jorge
dc.contributor.authorHenson, Kirklen
dc.contributor.authorGiangrandi, Simone
dc.contributor.authorDuffy, Ray
dc.contributor.authorSurdeanu, Radu
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorPagès, Xavier
dc.contributor.authorVan der Jeugd, Kees
dc.contributor.authorStolk, P.
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T05:24:11Z
dc.date.available2021-10-15T05:24:11Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7806
dc.sourceIIOimport
dc.titleLeakage optimatisation of ultra-shallow junctions formed by solid phase epitaxial regrowth (SPER)
dc.typeProceedings paper
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorVan der Jeugd, Kees
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage65
dc.source.endpage72
dc.source.conferenceUltra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic.
dc.source.conferencedate27/04/2003
dc.source.conferencelocationSanta Cruz, CA USA
imec.availabilityPublished - imec


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