Publication:
A new technique to fabricate Ultra-Shallow-Junctions, combining in-situ vapour HCl etching and in-situ doped epitaxial SiGe re-growth
Date
Loading...
Journal
Abstract
Description
Metrics
Views
2036 since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations
Metrics
Views
2036 since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations