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Resist strip and Cu diffusion barrier etch in Cu BEOL integration schemes in a Mattson HighlandsTM chamber

dc.contributor.authorMannaert, Geert
dc.contributor.authorVan Cauwenberghe, Marc
dc.contributor.authorSchmidt, M.O.
dc.contributor.authorVan Aelst, Joke
dc.contributor.authorHendrickx, Dirk
dc.contributor.authorStucchi, Michele
dc.contributor.authorConard, Thierry
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-15T05:35:16Z
dc.date.available2021-10-15T05:35:16Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7858
dc.sourceIIOimport
dc.titleResist strip and Cu diffusion barrier etch in Cu BEOL integration schemes in a Mattson HighlandsTM chamber
dc.typeProceedings paper
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorVan Cauwenberghe, Marc
dc.contributor.imecauthorVan Aelst, Joke
dc.contributor.imecauthorHendrickx, Dirk
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage267
dc.source.endpage271
dc.source.conferenceUltra Clean Processing of Silicon Surfaces 2002 - UCPSS
dc.source.conferencedate16/09/2002
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid-State Phenomena; Vol. 92


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