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Thin strain relaxed SiGe buffer layers on Si and SOI wafers made by He+ ion implantation and annealing
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1930 since deposited on 2021-10-15
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Acq. date: 2025-12-08
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1930 since deposited on 2021-10-15
1last month
1last week
Acq. date: 2025-12-08
Citations