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Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65nm device mode

dc.contributor.authorMontgomery, Patrick K.
dc.contributor.authorLucas, Kevin D.
dc.contributor.authorLitt, Lloyd C.
dc.contributor.authorConley, Will
dc.contributor.authorFanucchi, Eric
dc.contributor.authorvan Wingerden, Johannes
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorWiaux, Vincent
dc.contributor.authorTaylor, Darren
dc.contributor.authorCangemi, Michael J.
dc.contributor.authorKasprowicz, Bryan
dc.date.accessioned2021-10-15T05:46:51Z
dc.date.available2021-10-15T05:46:51Z
dc.date.issued2003-12
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7912
dc.sourceIIOimport
dc.titleComparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65nm device mode
dc.typeProceedings paper
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorWiaux, Vincent
dc.source.peerreviewno
dc.source.beginpage814
dc.source.endpage825
dc.source.conference23rd Annual BACUS Symposium on Photomask Technology
dc.source.conferencedate8/09/2003
dc.source.conferencelocationMonterey, Ca USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 5256


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