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A microstructural study of the thermal stability of atomic layer deposited Al2O3 thin films

dc.contributor.authorNistor, L.
dc.contributor.authorRichard, Olivier
dc.contributor.authorZhao, Chao
dc.contributor.authorBender, Hugo
dc.contributor.authorStesmans, Andre
dc.contributor.authorVan Tendeloo, G.
dc.date.accessioned2021-10-15T05:50:48Z
dc.date.available2021-10-15T05:50:48Z
dc.date.issued2003-04
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7930
dc.sourceIIOimport
dc.titleA microstructural study of the thermal stability of atomic layer deposited Al2O3 thin films
dc.typeProceedings paper
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorStesmans, Andre
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage397
dc.source.endpage400
dc.source.conferenceMicroscopy of Semiconducting Materials 2003
dc.source.conferencedate31/03/2003
dc.source.conferencelocationCambridge UK
imec.availabilityPublished - open access
imec.internalnotesIOP Conference Series; Vol. 180


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