A microstructural study of the thermal stability of atomic layer deposited Al2O3 thin films

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Authors
Nistor, L.; Richard, Olivier; Zhao, Chao; Bender, Hugo; Stesmans, Andre; Van Tendeloo, G.
Conference
Microscopy of Semiconducting Materials 2003
Title
A microstructural study of the thermal stability of atomic layer deposited Al2O3 thin films
Publication type
Proceedings paper
Embargo date
9999-12-31
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