Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Conference contributions
A microstructural study of the thermal stability of atomic layer deposited Al2O3 thin films
Publication:
A microstructural study of the thermal stability of atomic layer deposited Al2O3 thin films
Copy permalink
Date
2003
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
9159.pdf
378.06 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Nistor, L.
;
Richard, Olivier
;
Zhao, Chao
;
Bender, Hugo
;
Stesmans, Andre
;
Van Tendeloo, G.
Journal
Abstract
Description
Statistics
Views
2031
since deposited on 2021-10-15
1
last month
1
last week
Acq. date: 2026-07-16
Citations
Statistics
Views
2031
since deposited on 2021-10-15
1
last month
1
last week
Acq. date: 2026-07-16
Citations