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A microstructural study of the thermal stability of atomic layer deposited Al2O3 thin films
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A microstructural study of the thermal stability of atomic layer deposited Al2O3 thin films
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2003-04
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Nistor, L.
;
Richard, Olivier
;
Zhao, Chao
;
Bender, Hugo
;
Stesmans, Andre
;
Van Tendeloo, G.
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2026
since deposited on 2021-10-15
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last month
Acq. date: 2026-01-05
Citations