A microstructural study of the thermal stability of atomic layer deposited Al2O3 thin films

dc.contributor.author	Nistor, L.
dc.contributor.author	Richard, Olivier
dc.contributor.author	Zhao, Chao
dc.contributor.author	Bender, Hugo
dc.contributor.author	Stesmans, Andre
dc.contributor.author	Van Tendeloo, G.
dc.contributor.imecauthor	Richard, Olivier
dc.contributor.imecauthor	Bender, Hugo
dc.contributor.imecauthor	Stesmans, Andre
dc.contributor.orcidimec	Richard, Olivier::0000-0002-3994-8021
dc.date.accessioned	2021-10-15T05:50:48Z
dc.date.available	2021-10-15T05:50:48Z
dc.date.embargo	9999-12-31
dc.date.issued	2003-04
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/7930
dc.source.beginpage	397
dc.source.conference	Microscopy of Semiconducting Materials 2003
dc.source.conferencedate	31/03/2003
dc.source.conferencelocation	Cambridge UK
dc.source.endpage	400
dc.title	A microstructural study of the thermal stability of atomic layer deposited Al2O3 thin films
dc.type	Proceedings paper
dspace.entity.type	Publication
Files	Original bundle Name: 9159.pdf Size: 378.06 KB Format: Adobe Portable Document Format Download
Publication available in collections:	Conference contributions

Date