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Chemical and electrical dopant evolution during solid phase epitaxial regrowth

dc.contributor.authorPawlak, Bartek
dc.contributor.authorLindsay, Richard
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorKittl, Jorge
dc.contributor.authorSurdeanu, Radu
dc.contributor.authorDuffy, Ray
dc.contributor.authorStolk, P.
dc.date.accessioned2021-10-15T06:04:14Z
dc.date.available2021-10-15T06:04:14Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7990
dc.sourceIIOimport
dc.titleChemical and electrical dopant evolution during solid phase epitaxial regrowth
dc.typeProceedings paper
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.beginpage227
dc.source.endpage233
dc.source.conferenceUltra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic.
dc.source.conferencedate28/04/2003
dc.source.conferencelocationSanta Cruz, CA USA
imec.availabilityPublished - imec


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