dc.contributor.author | Peters, R.D. | |
dc.contributor.author | Lucas, K. | |
dc.contributor.author | Cobb, J.L. | |
dc.contributor.author | Parker, C. | |
dc.contributor.author | Patterson, K. | |
dc.contributor.author | McCauley, R. | |
dc.contributor.author | Ercken, Monique | |
dc.contributor.author | Van Roey, Frieda | |
dc.contributor.author | Vandenbroeck, Nadia | |
dc.contributor.author | Pollentier, Ivan | |
dc.date.accessioned | 2021-10-15T06:05:50Z | |
dc.date.available | 2021-10-15T06:05:50Z | |
dc.date.issued | 2003 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7997 | |
dc.source | IIOimport | |
dc.title | Line-edge roughness reduction and CD slimming using hardback processing | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Ercken, Monique | |
dc.contributor.imecauthor | Van Roey, Frieda | |
dc.contributor.imecauthor | Vandenbroeck, Nadia | |
dc.contributor.imecauthor | Pollentier, Ivan | |
dc.contributor.orcidimec | Pollentier, Ivan::0000-0002-4266-6500 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 1131 | |
dc.source.endpage | 1142 | |
dc.source.conference | Metrology, Inspection, and Process Control for Microlithography XVII | |
dc.source.conferencedate | 24/02/2003 | |
dc.source.conferencelocation | Santa Clara, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; Vol. 5038 | |