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Band gap of ALCVD mixed oxide AlZrO and HfAlO measured by XPS

dc.contributor.authorPetry, Jasmine
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorConard, Thierry
dc.date.accessioned2021-10-15T06:06:58Z
dc.date.available2021-10-15T06:06:58Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8002
dc.sourceIIOimport
dc.titleBand gap of ALCVD mixed oxide AlZrO and HfAlO measured by XPS
dc.typeOral presentation
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorConard, Thierry
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.source.peerreviewno
dc.source.conferenceE-MRS Spring Meeting Symposium I: Functional Metal Oxides - Semiconductor Structures
dc.source.conferencedate10/06/2003
dc.source.conferencelocationStrasbourg France
imec.availabilityPublished - imec


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