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An ESCA study on ion beam induced oxidation of Si

dc.contributor.authorOsiceanu, Petre
dc.contributor.authorAlay, Josep Lluis
dc.contributor.authorDe Coster, Walter
dc.date.accessioned2021-09-29T13:15:38Z
dc.date.available2021-09-29T13:15:38Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/809
dc.sourceIIOimport
dc.titleAn ESCA study on ion beam induced oxidation of Si
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage159
dc.source.endpage62
dc.source.conference18th International Semiconductor Conference. CAS'95 Proceedings
dc.source.conferencedate10/10/1995
dc.source.conferencelocationSinaia Romania
imec.availabilityPublished - open access


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