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Pre-amorphization and co-implantation suitability for advanced PMOS devices integration

dc.contributor.authorSurdeanu, Radu
dc.contributor.authorPawlak, Bartek
dc.contributor.authorLindsay, Richard
dc.contributor.authorVan Dal, Mark
dc.contributor.authorDoornbos, Gerben
dc.contributor.authorDachs, Charles
dc.contributor.authorPonomarev, Youri
dc.contributor.authorLoo, Josine
dc.contributor.authorHenson, Kirklen
dc.contributor.authorVerheijen, M.
dc.contributor.authorKaiser, M.
dc.contributor.authorPagès, Xavier
dc.contributor.authorJurczak, Gosia
dc.contributor.authorStolk, Peter
dc.date.accessioned2021-10-15T06:53:44Z
dc.date.available2021-10-15T06:53:44Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8196
dc.sourceIIOimport
dc.titlePre-amorphization and co-implantation suitability for advanced PMOS devices integration
dc.typeProceedings paper
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.imecauthorVan Dal, Mark
dc.contributor.imecauthorDoornbos, Gerben
dc.contributor.imecauthorJurczak, Gosia
dc.source.peerreviewno
dc.source.beginpage740
dc.source.endpage741
dc.source.conferenceExtended Abstracts of the 2003 International Conference on Solid State Device and Materials
dc.source.conferencedate16/09/2003
dc.source.conferencelocationTokyo Japan
imec.availabilityPublished - imec


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