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Numerical analysis of electromigration in thin film VLSI interconnections

dc.contributor.authorPetrescu, Violeta
dc.contributor.authorMouthaan, T.
dc.contributor.authorSchoenmaker, Wim
dc.contributor.authorAngelescu, Serban
dc.contributor.authorVissarion, R.
dc.contributor.authorDima, G.
dc.contributor.authorWallinga, H.
dc.contributor.authorProfirescu, M. D.
dc.date.accessioned2021-09-29T13:15:43Z
dc.date.available2021-09-29T13:15:43Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/820
dc.sourceIIOimport
dc.titleNumerical analysis of electromigration in thin film VLSI interconnections
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage327
dc.source.endpage30
dc.source.conference18th International Semiconductor Conference. CAS'95 Proceedings
dc.source.conferencedate10/10/1995
dc.source.conferencelocationSinaia Romania
imec.availabilityPublished - open access


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