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Feature biasing versus feature-assisted lithography. A comparison of proximity correction methods for 0.5*(l/NA) lithography

dc.contributor.authorPforr, Rainer
dc.contributor.authorWong, Alfred
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan den hove, Luc
dc.contributor.authorYen, Anthony
dc.contributor.authorPalmer, S.
dc.contributor.authorFuller, G.
dc.contributor.authorOtto, O.
dc.date.accessioned2021-09-29T13:15:43Z
dc.date.available2021-09-29T13:15:43Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/821
dc.sourceIIOimport
dc.titleFeature biasing versus feature-assisted lithography. A comparison of proximity correction methods for 0.5*(l/NA) lithography
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage150
dc.source.endpage170
dc.source.conferenceOptical Laser Microlithography VIII
dc.source.conferencedate22/02/1995
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 2440


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