Publication:

Physical characterization of HfO2 deposited on Ge substrates by MOCVD

Date

2003
Proceedings Paper
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Author(s)

Van Elshocht, Sven  
;
Brijs, Bert
;
Caymax, Matty  
;
Conard, Thierry  
;
De Gendt, Stefan  
;
Kubicek, Stefan  
;
Meuris, Marc  
;
Onsia, Bart  
;
Richard, Olivier  
;
Teerlinck, Ivo
;
Van Steenbergen, Jan  
;
Zhao, Chao
;
Heyns, Marc  

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