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Scalability of MOCVD-deposited Hafnium oxide

dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorCarter, Richard
dc.contributor.authorCaymax, Matty
dc.contributor.authorClaes, Martine
dc.contributor.authorConard, Thierry
dc.contributor.authorDate, Lucien
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorKaushik, Vidya
dc.contributor.authorKerber, Andreas
dc.contributor.authorKluth, J.
dc.contributor.authorLujan, Guilherme
dc.contributor.authorPetry, Jasmine
dc.contributor.authorPique, Didier
dc.contributor.authorRichard, Olivier
dc.contributor.authorRohr, Erika
dc.contributor.authorShimamoto, Yasuhiro
dc.contributor.authorTsai, Wilman
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-15T07:13:19Z
dc.date.available2021-10-15T07:13:19Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8271
dc.sourceIIOimport
dc.titleScalability of MOCVD-deposited Hafnium oxide
dc.typeProceedings paper
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDate, Lucien
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.source.peerreviewno
dc.source.beginpage59
dc.source.endpage64
dc.source.conferenceCMOS Front-End Materials and Process Technology
dc.source.conferencedate21/04/2003
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesMaterials Research Society Symposium Proceedings; Vol. 765


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