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Critical metrology for ultrathin high k dielectrics

dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorBrijs, Bert
dc.contributor.authorBender, Hugo
dc.contributor.authorConard, Thierry
dc.contributor.authorPetry, Jasmine
dc.contributor.authorRichard, Olivier
dc.contributor.authorBlasco, X.
dc.contributor.authorNafría, M.
dc.date.accessioned2021-10-15T07:25:54Z
dc.date.available2021-10-15T07:25:54Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8319
dc.sourceIIOimport
dc.titleCritical metrology for ultrathin high k dielectrics
dc.typeProceedings paper
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorRichard, Olivier
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.source.peerreviewno
dc.source.beginpage129
dc.source.endpage138
dc.source.conferenceCharacterization and Metrology for ULSI Technology
dc.source.conferencedate24/03/2003
dc.source.conferencelocationAustin, TX USA
imec.availabilityPublished - imec
imec.internalnotesAIP Conference Proceedings; Vol. 683


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