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Physical characterization of ultrathin high k dielectrics

dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorBrijs, Bert
dc.contributor.authorBender, Hugo
dc.contributor.authorConard, Thierry
dc.contributor.authorPetry, Jasmine
dc.contributor.authorRichard, Olivier
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorDelabie, Annelies
dc.contributor.authorCaymax, Matty
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorCosnier, Vincent
dc.contributor.authorGreen, Martin
dc.contributor.authorChen, Jerry
dc.date.accessioned2021-10-15T07:26:33Z
dc.date.available2021-10-15T07:26:33Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8321
dc.sourceIIOimport
dc.titlePhysical characterization of ultrathin high k dielectrics
dc.typeProceedings paper
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpage40
dc.source.endpage50
dc.source.conference8th International Symposium on Plasma-and Process-Induced Damage
dc.source.conferencedate24/04/2003
dc.source.conferencelocationParis France
imec.availabilityPublished - imec


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