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Cleaning uniformity of silicon wafers in megasonic tanks

dc.contributor.authorVereecke, Guy
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorVeltens, J.
dc.contributor.authorVos, Rita
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-15T07:38:38Z
dc.date.available2021-10-15T07:38:38Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8365
dc.sourceIIOimport
dc.titleCleaning uniformity of silicon wafers in megasonic tanks
dc.typeOral presentation
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.source.peerreviewno
dc.source.conferenceUltrasonics International
dc.source.conferencedate30/06/2003
dc.source.conferencelocationGranada Spain
imec.availabilityPublished - imec


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