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Resolving line collapse in 193nm lithography with surfactinated post develop rinse solutions

dc.contributor.authorVersluijs, Janko
dc.contributor.authorMisat, Sylvain Irénée
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorGrozev, Grozdan
dc.contributor.authorFurusho, Tetsunari
dc.date.accessioned2021-10-15T07:43:24Z
dc.date.available2021-10-15T07:43:24Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8383
dc.sourceIIOimport
dc.titleResolving line collapse in 193nm lithography with surfactinated post develop rinse solutions
dc.typeProceedings paper
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorGrozev, Grozdan
dc.source.peerreviewno
dc.source.conferenceInterface '03
dc.source.conferencedate21/09/2003
dc.source.conferencelocationSan Diego usa
imec.availabilityPublished - imec


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