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Outplating of metallic contaminants on silicon wafers from diluted acid solutions

dc.contributor.authorRotondaro, Antonio
dc.contributor.authorHurd, Trace
dc.contributor.authorSchmidt, Harald
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorHeyns, Marc
dc.contributor.authorClaeys, Cor
dc.date.accessioned2021-09-29T13:15:59Z
dc.date.available2021-09-29T13:15:59Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/842
dc.sourceIIOimport
dc.titleOutplating of metallic contaminants on silicon wafers from diluted acid solutions
dc.typeProceedings paper
dc.contributor.imecauthorHeyns, Marc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage183
dc.source.endpage188
dc.source.conferenceUltraclean Semiconductor Processing Technology and Surface Chemical Cleaning and Passivation
dc.source.conferencedate17/04/1995
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access
imec.internalnotesMRS Symposium Proceedings; Vol. 386


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