Show simple item record

Charge trapping and mobility degradation in MOCVD hafnium silicate gate dielectric stack structures

dc.contributor.authorYoung, C.D.
dc.contributor.authorKerber, Andreas
dc.contributor.authorHou, T.H.
dc.contributor.authorCartier, E.
dc.contributor.authorBrown, G.A.
dc.contributor.authorBersuker, G.
dc.contributor.authorKim, Y.
dc.contributor.authorLim, C.
dc.contributor.authorGutt, J.
dc.contributor.authorLysaght, P.
dc.contributor.authorBennett, J.
dc.contributor.authorLee, C.H.
dc.contributor.authorGopalan, S.
dc.contributor.authorGardner, M.
dc.contributor.authorZeitzoff, P.
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorMurto, R.W.
dc.contributor.authorHuff, H.R.
dc.date.accessioned2021-10-15T07:56:32Z
dc.date.available2021-10-15T07:56:32Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8430
dc.sourceIIOimport
dc.titleCharge trapping and mobility degradation in MOCVD hafnium silicate gate dielectric stack structures
dc.typeMeeting abstract
dc.contributor.imecauthorGroeseneken, Guido
dc.source.peerreviewno
dc.source.conference204th Meeting of the Electrochemical Society: 2nd Int. Symp. on High Dielectric Constant Materials
dc.source.conferencedate12/10/2003
dc.source.conferencelocationOrlando, FL USA
imec.availabilityPublished - imec
imec.internalnotesAbstract 577


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record