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Ellipsometric porosimetry of porous low-k films with quazi-closed cavities

dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorMogilnikov, K.P.
dc.contributor.authorYim, J-H.
dc.date.accessioned2021-10-15T12:40:32Z
dc.date.available2021-10-15T12:40:32Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8527
dc.sourceIIOimport
dc.titleEllipsometric porosimetry of porous low-k films with quazi-closed cavities
dc.typeProceedings paper
dc.source.peerreviewno
dc.source.beginpage55
dc.source.endpage60
dc.source.conferenceMaterials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics
dc.source.conferencedate12/04/2004
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesMRS Symposium Proceedings; Vol. 812


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