dc.contributor.author | Beckx, Stephan | |
dc.contributor.author | Demand, Marc | |
dc.contributor.author | Locorotondo, Sabrina | |
dc.contributor.author | Henson, K. | |
dc.contributor.author | Claes, Martine | |
dc.contributor.author | Paraschiv, Vasile | |
dc.contributor.author | Shamiryan, Denis | |
dc.contributor.author | Jaenen, Patrick | |
dc.contributor.author | Boullart, Werner | |
dc.contributor.author | De Gendt, Stefan | |
dc.contributor.author | Biesemans, Serge | |
dc.contributor.author | Vanhaelemeersch, Serge | |
dc.contributor.author | Vertommen, Johan | |
dc.contributor.author | Coenegrachts, Bart | |
dc.date.accessioned | 2021-10-15T12:41:46Z | |
dc.date.available | 2021-10-15T12:41:46Z | |
dc.date.issued | 2004 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/8552 | |
dc.source | IIOimport | |
dc.title | Implementation of high-K and metal gate materials for the 45nm node and beyond: gate patterning development | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Beckx, Stephan | |
dc.contributor.imecauthor | Demand, Marc | |
dc.contributor.imecauthor | Locorotondo, Sabrina | |
dc.contributor.imecauthor | Claes, Martine | |
dc.contributor.imecauthor | Paraschiv, Vasile | |
dc.contributor.imecauthor | Jaenen, Patrick | |
dc.contributor.imecauthor | Boullart, Werner | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.imecauthor | Biesemans, Serge | |
dc.contributor.imecauthor | Vanhaelemeersch, Serge | |
dc.contributor.imecauthor | Coenegrachts, Bart | |
dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.contributor.orcidimec | Vanhaelemeersch, Serge::0000-0003-2102-7395 | |
dc.source.peerreview | no | |
dc.source.conference | Workshop on Dielectrics in Microelectronics - WODIM | |
dc.source.conferencedate | 28/06/2004 | |
dc.source.conferencelocation | Kinsale Ireland | |
imec.availability | Published - imec | |