GAFM characterization of the dependence of HfAlOx electrical behavior on post-deposition annealing temperature

Publication:

2004

Journal article

Author(s)

Blasco, X.

;

Petry, Jasmine

;

Nafria, M.

;

Aymerich, X.

;

;

Microelectronic Engineering

2055 since deposited on 2021-10-15

3last month

Acq. date: 2026-04-26