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dc.contributor.authorChamirian, Oxana
dc.contributor.authorLauwers, Anne
dc.contributor.authorKittl, Jorge
dc.contributor.authorVan Dal, Mark
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorVrancken, Christa
dc.contributor.authorLindsay, Richard
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T12:50:36Z
dc.date.available2021-10-15T12:50:36Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8667
dc.sourceIIOimport
dc.titleNi silicide morphology on small features
dc.typeProceedings paper
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorVan Dal, Mark
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.conferenceSilicon Front-End Junction Formation - Physics and Technology
dc.source.conferencedate12/04/2004
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesMaterials Research Society Symposium Proceedings; Vol. 810


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