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Advanced front-end processes for the 45nm CMOS technology node

dc.contributor.authorCollart, E.J.H.
dc.contributor.authorFelch, S.B.
dc.contributor.authorGraoui, H.
dc.contributor.authorTallavarjula, S.
dc.contributor.authorLindsay, Richard
dc.contributor.authorPawlak, Bartek
dc.contributor.authorvan den Berg, J.A.
dc.contributor.authorCowern, N.E.B.
dc.contributor.authorKirby, K.J.
dc.date.accessioned2021-10-15T12:55:10Z
dc.date.available2021-10-15T12:55:10Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8708
dc.sourceIIOimport
dc.titleAdvanced front-end processes for the 45nm CMOS technology node
dc.typeOral presentation
dc.contributor.imecauthorPawlak, Bartek
dc.source.peerreviewno
dc.source.conferenceE-MRS Spring Meeting Symposium B: Materials Science Issues in Advanced CMOS Source-Drain Engineering
dc.source.conferencedate24/05/2004
dc.source.conferencelocationStrasbourg France
imec.availabilityPublished - imec


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