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Plasma nitrided silicon rich oxide as an extension to ultra-thin nitrided oxide gate dielectrics

dc.contributor.authorCubaynes, Florence
dc.contributor.authorVenezia, V.
dc.contributor.authorEveraert, Jean-Luc
dc.contributor.authorShi, Xiaoping
dc.contributor.authorRothschild, Aude
dc.contributor.authorSchaekers, Marc
dc.date.accessioned2021-10-15T12:59:01Z
dc.date.available2021-10-15T12:59:01Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8740
dc.sourceIIOimport
dc.titlePlasma nitrided silicon rich oxide as an extension to ultra-thin nitrided oxide gate dielectrics
dc.typeProceedings paper
dc.contributor.imecauthorEveraert, Jean-Luc
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.source.peerreviewno
dc.source.conference13th Workshop on Dielectrics in Microelectronics - WODIM
dc.source.conferencedate28/06/2004
dc.source.conferencelocationCork Ireland
imec.availabilityPublished - imec


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