Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Conference contributions
Ge deep sub-micron pFETs with etched TaN metal gate on a High-K dielectric, fabricated in a 200mm silicon prototyping line
Publication:
Ge deep sub-micron pFETs with etched TaN metal gate on a High-K dielectric, fabricated in a 200mm silicon prototyping line
Copy permalink
Date
2004
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
De Jaeger, Brice
;
Houssa, Michel
;
Satta, Alessandra
;
Kubicek, Stefan
;
Verheyen, Peter
;
Van Steenbergen, Jan
;
Croon, Jeroen
;
Kaczer, Ben
;
Van Elshocht, Sven
;
Delabie, Annelies
;
Kunnen, Eddy
;
Sleeckx, Erik
;
Teerlinck, Ivo
;
Lindsay, Richard
;
Schram, Tom
;
Chiarella, Thomas
;
Degraeve, Robin
;
Conard, Thierry
;
Poortmans, Jef
;
Winderickx, Gillis
;
Boullart, Werner
;
Schaekers, Marc
;
Mertens, Paul
;
Caymax, Matty
;
Vandervorst, Wilfried
;
Van Moorhem, Els
;
Biesemans, Serge
;
De Meyer, Kristin
;
Ragnarsson, Lars-Ake
;
Lee, S.
;
Kota, G.
;
Raskin, G.
;
Mijlemans, P.
;
Autran, J.L.
;
Afanas'ev, V.
;
Stesmans, A.
;
Meuris, Marc
;
Heyns, Marc
Journal
Abstract
Description
Metrics
Views
1993
since deposited on 2021-10-15
2
last month
Acq. date: 2026-01-10
Citations
Metrics
Views
1993
since deposited on 2021-10-15
2
last month
Acq. date: 2026-01-10
Citations