Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Articles
Selective epitaxial deposition of strained silicon: a simple and effective method for fabricating high performance MOSFET devices
Publication:
Selective epitaxial deposition of strained silicon: a simple and effective method for fabricating high performance MOSFET devices
Date
2004
Journal article
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Delhougne, Romain
;
Eneman, Geert
;
Caymax, Matty
;
Loo, Roger
;
Meunier-Beillard, Philippe
;
Verheyen, Peter
;
Vandervorst, Wilfried
;
De Meyer, Kristin
;
Heyns, Marc
Journal
Solid State Electronics
Abstract
Description
Metrics
Views
2028
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations
Metrics
Views
2028
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations