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Introducing novel metal gate materials for decananometer CMOS in the agile fab: a case study

dc.contributor.authorDeweerd, Wim
dc.contributor.authorSchram, Tom
dc.contributor.authorCatana, Gabriela
dc.contributor.authorShamiryan, Denis
dc.contributor.authorGaraud, Sylvain
dc.contributor.authorHellin, David
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorWickramanayaka, S.
dc.contributor.authorKawashima, T.
dc.contributor.authorYamada, N.
dc.contributor.authorVertommen, Johan
dc.contributor.authorLander, Rob
dc.date.accessioned2021-10-15T13:14:26Z
dc.date.available2021-10-15T13:14:26Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8844
dc.sourceIIOimport
dc.titleIntroducing novel metal gate materials for decananometer CMOS in the agile fab: a case study
dc.typeProceedings paper
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpage53
dc.source.endpage56
dc.source.conferenceProceedings of the International Symposium on Semiconductor Manufacturing - ISSM
dc.source.conferencedate27/09/2004
dc.source.conferencelocationTokyo Japan
imec.availabilityPublished - imec


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