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Implementation of pattern-specific illumination pupil optimization on Step & Scan systems

dc.contributor.authorEngelen, A.
dc.contributor.authorSocha, R.
dc.contributor.authorHendrickx, Eric
dc.contributor.authorScheepers, W.
dc.contributor.authorNowak, F.
dc.contributor.authorvan Dam, M.
dc.contributor.authorLiebchen, Armin
dc.contributor.authorFaas, D.
dc.date.accessioned2021-10-15T13:21:19Z
dc.date.available2021-10-15T13:21:19Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8885
dc.sourceIIOimport
dc.titleImplementation of pattern-specific illumination pupil optimization on Step & Scan systems
dc.typeProceedings paper
dc.contributor.imecauthorHendrickx, Eric
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1323
dc.source.endpage1333
dc.source.conferenceOptical Microlithography XVII
dc.source.conferencedate22/02/2004
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol. 5377


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