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ALD deposition of high-k and metal gate stacks for advanced CMOS applications

dc.contributor.authorHeyns, Marc
dc.contributor.authorBeckx, Stephan
dc.contributor.authorCaymax, Matty
dc.contributor.authorClaes, Martine
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorDegraeve, Robin
dc.contributor.authorDelabie, Annelies
dc.contributor.authorDeweerd, Wim
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorHooker, Jacob
dc.contributor.authorHoussa, Michel
dc.contributor.authorKwak, Dong Hwa
dc.contributor.authorLander, Rob
dc.contributor.authorLujan, Guilherme
dc.contributor.authorMaes, Jan
dc.contributor.authorNiwa, Masaaki
dc.contributor.authorPantisano, Luigi
dc.contributor.authorPuurunen, R.
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorRohr, Erika
dc.contributor.authorSchram, Tom
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-15T13:49:26Z
dc.date.available2021-10-15T13:49:26Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9029
dc.sourceIIOimport
dc.titleALD deposition of high-k and metal gate stacks for advanced CMOS applications
dc.typeProceedings paper
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewno
dc.source.conferenceAtomic Layer Deposition Conference
dc.source.conferencedate16/08/2004
dc.source.conferencelocationHelsinki Finlans
imec.availabilityPublished - imec


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