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dc.contributor.authorIacopi, Francesca
dc.contributor.authorTravaly, Youssef
dc.contributor.authorStucchi, Michele
dc.contributor.authorStruyf, Herbert
dc.contributor.authorPeeters, Stefan
dc.contributor.authorJonckheere, Rik
dc.contributor.authorLeunissen, Peter
dc.contributor.authorTokei, Zsolt
dc.contributor.authorSutcliffe, Victor
dc.contributor.authorRichard, Olivier
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T14:01:02Z
dc.date.available2021-10-15T14:01:02Z
dc.date.issued2004-05
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9084
dc.sourceIIOimport
dc.titleSidewall damage and electrical performance of porous dielectrics in narrow spaced interconnects
dc.typeProceedings paper
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorPeeters, Stefan
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.source.peerreviewyes
dc.source.beginpageF1.5
dc.source.conferenceMaterials,Technology, and Reliability of Andvanced Interconnects and Low-K Dielectrics
dc.source.conferencedate11/04/2004
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesMRS Symposium Proceedings; Vol. 812


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