Authors

Kottantharayil, Anil; Veloso, Anabela; Kubicek, Stefan; Schram, Tom; Augendre, Emmanuel; de Marneffe, Jean-Francois; Devriendt, Katia; Lauwers, Anne; Brus, Stephan; Henson, Kirklen; Biesemans, Serge

Conference

Technical Digest VLSI Technology Symposium

Title

Demonstration of fully Ni-silicided metal gates on HfO2 based high-k gate dielectrics as a candidate for low power applications

Publication type

Proceedings paper