Publication:
Demonstration of fully Ni-silicided metal gates on HfO2 based high-k gate dielectrics as a candidate for low power applications
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1896 since deposited on 2021-10-15
3last month
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Acq. date: 2026-08-09
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Statistics
Views
1896 since deposited on 2021-10-15
3last month
1last week
Acq. date: 2026-08-09
Citations