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Demonstration of fully Ni-silicided metal gates on HfO2 based high-k gate dielectrics as a candidate for low power applications
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1894 since deposited on 2021-10-15
1last month
Acq. date: 2026-07-18
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Statistics
Views
1894 since deposited on 2021-10-15
1last month
Acq. date: 2026-07-18
Citations