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Impact of hyper-NA reticle properties on ArF immersion lithography

dc.contributor.authorLeunissen, Peter
dc.contributor.authorRonse, Kurt
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorJonckheere, Rik
dc.contributor.authorAksenov, Yuri
dc.contributor.authorBekaert, Joost
dc.date.accessioned2021-10-15T14:26:49Z
dc.date.available2021-10-15T14:26:49Z
dc.date.issued2004-12
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9198
dc.sourceIIOimport
dc.titleImpact of hyper-NA reticle properties on ArF immersion lithography
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorBekaert, Joost
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.source.peerreviewno
dc.source.beginpageJan-15
dc.source.endpageJan-21
dc.source.conferenceProceedings SEMICON Japan
dc.source.conferencedate1/12/2004
dc.source.conferencelocationChiba Japan
imec.availabilityPublished - imec


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