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Publication:

157-nm photoresist process optimization for a full-field scanner

Date

2004

Proceedings Paper

Simple item page Full metadata Statistics

Files

9527.pdf 1.77 MB

Author(s)

;

Stepanenko, Nickolay

;

;

Van Roey, Frieda

;

Van Den Heuvel, Dieter

;

Goethals, Mieke

Statistics

2087 since deposited on 2021-10-15

Acq. date: 2026-07-27