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157-nm photoresist process optimization for a full-field scanner

dc.contributor.authorLight, Scott
dc.contributor.authorStepanenko, Nickolay
dc.contributor.authorGronheid, Roel
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorGoethals, Mieke
dc.date.accessioned2021-10-15T14:27:57Z
dc.date.available2021-10-15T14:27:57Z
dc.date.issued2004-03
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9203
dc.sourceIIOimport
dc.title157-nm photoresist process optimization for a full-field scanner
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1658
dc.source.endpage1668
dc.source.conferenceOptical Microlithography XVII
dc.source.conferencedate22/02/2004
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; vol. 5377


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