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In-situ TEM on He implantation induced defects in SiGe/Si

dc.contributor.authorLuysberg, Martina
dc.contributor.authorHueging, N.
dc.contributor.authorUrban, K.
dc.contributor.authorBuca, D.
dc.contributor.authorHolländer, B.
dc.contributor.authorMantl, S.
dc.contributor.authorMorschbacher, M.
dc.contributor.authorFichtner, P.F.P.
dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.date.accessioned2021-10-15T14:36:32Z
dc.date.available2021-10-15T14:36:32Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9236
dc.sourceIIOimport
dc.titleIn-situ TEM on He implantation induced defects in SiGe/Si
dc.typeProceedings paper
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage377
dc.source.endpage378
dc.source.conferenceProceedings of the 13th European Microscopy Congress. Volume 2: Materials Sciences
dc.source.conferencedate22/08/2004
dc.source.conferencelocationAntwerpen Belgium
imec.availabilityPublished - open access


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